Characterisation of InAs-based epilayers by FTIR spectroscopy
- Authors: Baisitse, Tshepiso Revonia
- Date: 2007
- Subjects: Fourier transform infrared spectroscopy , Gallium arsenide semiconductors
- Language: English
- Type: Thesis , Masters , MSc
- Identifier: vital:10534 , http://hdl.handle.net/10948/474 , Fourier transform infrared spectroscopy , Gallium arsenide semiconductors
- Description: This study focuses on the characterization of InAs and InAs1-xSbx epitaxial layers by infrared reflectance and transmittance spectroscopy and Hall measurements. Reflectance measurements were performed in order to obtain the dielectric parameters and to extract from these information about the electrical properties (mobility and carrier concentration) of this important III-V material system. The transmittance measurements were used to determine the bandgap of InAsSb. Infrared reflectivity and transmittance measurements were performed in the wavelength range 200 – 2000 cm-1 on InAs and InAsSb layers grown on three types of substrates. A classical two oscillator model that takes into account both the free carriers and the lattice, was used to analyse the reflectance data using the BMDP® computer curve fitting software. The dielectric parameters and the electrical properties (carrier concentration and mobility) were extracted from the simulations. Due to the low free carrier concentration in the epitaxial structures, the plasma resonance frequency (ωp) values obtained from the simulations of reflectance spectra measured above 200 cm-1, were in the order of 20-30 cm-1. These low values were confirmed by direct measurements of ωp in reflectance spectra obtained in the range 15-200 cm-1. The simulated carrier concentration and mobility values determined optically were compared to the values determined by Hall measurements at room temperature and previously reported values by other researchers. The simulated values obtained were in reasonable agreement with the Hall values. The simulated and measured carrier concentrations obtained for InAs layers were significantly higher than the intrinsic carrier concentration for InAs at room temperature, indicating notable concentrations of donors resulting from the growth process.
- Full Text:
- Date Issued: 2007
- Authors: Baisitse, Tshepiso Revonia
- Date: 2007
- Subjects: Fourier transform infrared spectroscopy , Gallium arsenide semiconductors
- Language: English
- Type: Thesis , Masters , MSc
- Identifier: vital:10534 , http://hdl.handle.net/10948/474 , Fourier transform infrared spectroscopy , Gallium arsenide semiconductors
- Description: This study focuses on the characterization of InAs and InAs1-xSbx epitaxial layers by infrared reflectance and transmittance spectroscopy and Hall measurements. Reflectance measurements were performed in order to obtain the dielectric parameters and to extract from these information about the electrical properties (mobility and carrier concentration) of this important III-V material system. The transmittance measurements were used to determine the bandgap of InAsSb. Infrared reflectivity and transmittance measurements were performed in the wavelength range 200 – 2000 cm-1 on InAs and InAsSb layers grown on three types of substrates. A classical two oscillator model that takes into account both the free carriers and the lattice, was used to analyse the reflectance data using the BMDP® computer curve fitting software. The dielectric parameters and the electrical properties (carrier concentration and mobility) were extracted from the simulations. Due to the low free carrier concentration in the epitaxial structures, the plasma resonance frequency (ωp) values obtained from the simulations of reflectance spectra measured above 200 cm-1, were in the order of 20-30 cm-1. These low values were confirmed by direct measurements of ωp in reflectance spectra obtained in the range 15-200 cm-1. The simulated carrier concentration and mobility values determined optically were compared to the values determined by Hall measurements at room temperature and previously reported values by other researchers. The simulated values obtained were in reasonable agreement with the Hall values. The simulated and measured carrier concentrations obtained for InAs layers were significantly higher than the intrinsic carrier concentration for InAs at room temperature, indicating notable concentrations of donors resulting from the growth process.
- Full Text:
- Date Issued: 2007
Towards the development of InAs/GaInSb strained-layer superlattices for infrared detection
- Authors: Botha, Lindsay
- Date: 2008
- Subjects: Gallium arsenide semiconductors , Indium alloys , Compound semiconductors , Organometallic compounds , Infrared detectors , Infrared technology , Superlattices as materials
- Language: English
- Type: Thesis , Masters , MSc
- Identifier: vital:10526 , http://hdl.handle.net/10948/713 , Gallium arsenide semiconductors , Indium alloys , Compound semiconductors , Organometallic compounds , Infrared detectors , Infrared technology , Superlattices as materials
- Description: This study focuses on the development of InAs/GaInSb strained-layer superlattice structures by metal organic chemical vapour deposition (MOCVD), and deals with two aspects of the development of InAs/GaInSb SLS’s by MOCVD viz. the deposition of nano-scale (~100 Å) GaInSb layers, and the electrical characterization of unstrained InAs. The first part of this work aims to study the MOCVD growth of GaInSb layers in terms of deposition rate and indium incorporation on the nano-scale. This task is approached by first optimizing the growth of relatively thick (~2 μm) epitaxial films, and then assuming similar growth parameters during nano-scale deposition. The GaInSb layers were grown as part of GaInSb/GaSb quantum well (QW) structures. By using this approach, the GaInSb QW’s (~100 Å) could be characterized with the use of photoluminescence spectroscopy, which, when used in conjunction with transmission electron microscopy and/or X-ray diffractomery, proves useful in the analysis of such small scale deposition. It is shown that the growth rate of GaInSb on the nano-scale approaches the nominal growth rates determined from thick (~2 μm) GaInSb calibration layers. The In incorporation efficiency in nano-layers, however, was markedly lower than what was predicted by the GaInSb calibration layers. This reduction in indium incorporation could be the result of the effects of strain on In incorporation. The choice of substrate orientation for QW deposition was also studied. QW structures were grown simultaneously on both (100) and 2°off (100) GaSb(Te) substrates, and it is shown that growth on non-vicinal substrates is more conducive to the deposition of high quality QW structures. The second part of this study focuses on the electrical characterization of unstrained InAs. It is long known that conventional Hall measurements cannot be used to accurately characterize InAs epitaxial layers, as a result of parallel conduction resulting from surface and/or interface effects. This study looks at extracting the surface and bulk electrical properties of n-type InAs thin films directly from variable magnetic field Hall measurements. For p-type InAs, the situation is complicated by the relatively large electron to hole mobility ratio of InAs which tends to conceal the p-type nature of InAs thin films from Hall measurements. Here, this effect is illustrated by way of theoretical simulation of Hall data.
- Full Text:
- Date Issued: 2008
- Authors: Botha, Lindsay
- Date: 2008
- Subjects: Gallium arsenide semiconductors , Indium alloys , Compound semiconductors , Organometallic compounds , Infrared detectors , Infrared technology , Superlattices as materials
- Language: English
- Type: Thesis , Masters , MSc
- Identifier: vital:10526 , http://hdl.handle.net/10948/713 , Gallium arsenide semiconductors , Indium alloys , Compound semiconductors , Organometallic compounds , Infrared detectors , Infrared technology , Superlattices as materials
- Description: This study focuses on the development of InAs/GaInSb strained-layer superlattice structures by metal organic chemical vapour deposition (MOCVD), and deals with two aspects of the development of InAs/GaInSb SLS’s by MOCVD viz. the deposition of nano-scale (~100 Å) GaInSb layers, and the electrical characterization of unstrained InAs. The first part of this work aims to study the MOCVD growth of GaInSb layers in terms of deposition rate and indium incorporation on the nano-scale. This task is approached by first optimizing the growth of relatively thick (~2 μm) epitaxial films, and then assuming similar growth parameters during nano-scale deposition. The GaInSb layers were grown as part of GaInSb/GaSb quantum well (QW) structures. By using this approach, the GaInSb QW’s (~100 Å) could be characterized with the use of photoluminescence spectroscopy, which, when used in conjunction with transmission electron microscopy and/or X-ray diffractomery, proves useful in the analysis of such small scale deposition. It is shown that the growth rate of GaInSb on the nano-scale approaches the nominal growth rates determined from thick (~2 μm) GaInSb calibration layers. The In incorporation efficiency in nano-layers, however, was markedly lower than what was predicted by the GaInSb calibration layers. This reduction in indium incorporation could be the result of the effects of strain on In incorporation. The choice of substrate orientation for QW deposition was also studied. QW structures were grown simultaneously on both (100) and 2°off (100) GaSb(Te) substrates, and it is shown that growth on non-vicinal substrates is more conducive to the deposition of high quality QW structures. The second part of this study focuses on the electrical characterization of unstrained InAs. It is long known that conventional Hall measurements cannot be used to accurately characterize InAs epitaxial layers, as a result of parallel conduction resulting from surface and/or interface effects. This study looks at extracting the surface and bulk electrical properties of n-type InAs thin films directly from variable magnetic field Hall measurements. For p-type InAs, the situation is complicated by the relatively large electron to hole mobility ratio of InAs which tends to conceal the p-type nature of InAs thin films from Hall measurements. Here, this effect is illustrated by way of theoretical simulation of Hall data.
- Full Text:
- Date Issued: 2008
Radiation damage in GaAs and SiC
- Authors: Janse van Vuuren, Arno
- Date: 2011
- Subjects: Gallium arsenide semiconductors
- Language: English
- Type: Thesis , Masters , MSc
- Identifier: vital:10515 , http://hdl.handle.net/10948/1477 , Gallium arsenide semiconductors
- Description: In this dissertation the microstructure and hardness of phosphorous implanted SiC and neutron irradiated SiC and GaAs have been investigated. SiC is important due to its application as a barrier coating layer in coated particle fuel used in high temperature gas cooled reactors. The characterisation of neutron irradiated GaAs has been included in this study in order to compare the radiation damage produced by protons and neutrons since proton bombardment of SiC could in principle be used for out-of-reactor simulations of the neutron irradiation damage created in SiC during reactor operation. The following SiC and GaAs compounds were investigated: As-implanted and annealed single crystal 6H-SiC wafers and polycrystalline 3C-SiC bulk material implanted with phosphorous ions. As-irradiated and annealed polycrystalline 3C-SiC bulk material irradiated with fast neutrons. As-irradiated and annealed single crystal GaAs wafers irradiated with fast neutrons. The main techniques used for the analyses were transmission electron microscopy (TEM) and nano-indentation hardness testing. The following results were obtained for the investigation of implanted and irradiated SiC and GaAs: Phosphorous Implanted 6H-SiC and 3C-SiC The depth of the P+ ion damage was found to be in good agreement with predictions by TRIM 2010. Micro-diffraction of the damage region in P+ implanted 6H-SiC (dose 5×1016 ions/cm2) indicates that amorphization occurred and that recrystallisation of this layer occurred during annealing at 1200°C. TEM analysis revealed that the layer recrystallised in the 3C phase of SiC and twin defects also formed within the layer. Micro-diffraction of the damage region in P+ implanted 3C-SiC (dose 1×1015 ions/cm2) indicates that amorphization also occurred for this sample and that recrystallisation of this layer occurred during annealing at 800°C. Nano-hardness testing of the P+ implanted 6H-SiC indicated that the hardness of the implanted SiC was initially much lower than unimplanted SiC due to the formation of an amorphous layer during ion implantation. After annealing the implanted SiC at 800°C and 1200°C, the hardness increased due to re-crystallisation and point defect hardening. Neutron Irradiated 3C-SiC TEM investigations of neutron irradiated 3C-SiC revealed the presence dark spot defects for SiC samples irradiated to a dose of 5.9×1021 n/cm2 and 9.6×1021 n/cm2. Neutron Irradiated GaAs TEM investigation revealed a high density of dislocation loops in the unannealed neutron irradiated GaAs. The loop diameters increased after post-irradiation annealing in the range 600 to 800 °C. The dislocation loops were found to be of interstitial type lying on the {110} cleavage planes of GaAs. This finding is in agreement with earlier studies on 300 keV proton bombarded and 1 MeV electron irradiated GaAs where interstitial loops on {110} planes became visible after annealing at temperatures exceeding 500 °C. The small dislocation loops on the {110} planes of the neutron irradiated GaAs transformed to large loops and dislocations after annealing at 1000 °C.
- Full Text:
- Date Issued: 2011
- Authors: Janse van Vuuren, Arno
- Date: 2011
- Subjects: Gallium arsenide semiconductors
- Language: English
- Type: Thesis , Masters , MSc
- Identifier: vital:10515 , http://hdl.handle.net/10948/1477 , Gallium arsenide semiconductors
- Description: In this dissertation the microstructure and hardness of phosphorous implanted SiC and neutron irradiated SiC and GaAs have been investigated. SiC is important due to its application as a barrier coating layer in coated particle fuel used in high temperature gas cooled reactors. The characterisation of neutron irradiated GaAs has been included in this study in order to compare the radiation damage produced by protons and neutrons since proton bombardment of SiC could in principle be used for out-of-reactor simulations of the neutron irradiation damage created in SiC during reactor operation. The following SiC and GaAs compounds were investigated: As-implanted and annealed single crystal 6H-SiC wafers and polycrystalline 3C-SiC bulk material implanted with phosphorous ions. As-irradiated and annealed polycrystalline 3C-SiC bulk material irradiated with fast neutrons. As-irradiated and annealed single crystal GaAs wafers irradiated with fast neutrons. The main techniques used for the analyses were transmission electron microscopy (TEM) and nano-indentation hardness testing. The following results were obtained for the investigation of implanted and irradiated SiC and GaAs: Phosphorous Implanted 6H-SiC and 3C-SiC The depth of the P+ ion damage was found to be in good agreement with predictions by TRIM 2010. Micro-diffraction of the damage region in P+ implanted 6H-SiC (dose 5×1016 ions/cm2) indicates that amorphization occurred and that recrystallisation of this layer occurred during annealing at 1200°C. TEM analysis revealed that the layer recrystallised in the 3C phase of SiC and twin defects also formed within the layer. Micro-diffraction of the damage region in P+ implanted 3C-SiC (dose 1×1015 ions/cm2) indicates that amorphization also occurred for this sample and that recrystallisation of this layer occurred during annealing at 800°C. Nano-hardness testing of the P+ implanted 6H-SiC indicated that the hardness of the implanted SiC was initially much lower than unimplanted SiC due to the formation of an amorphous layer during ion implantation. After annealing the implanted SiC at 800°C and 1200°C, the hardness increased due to re-crystallisation and point defect hardening. Neutron Irradiated 3C-SiC TEM investigations of neutron irradiated 3C-SiC revealed the presence dark spot defects for SiC samples irradiated to a dose of 5.9×1021 n/cm2 and 9.6×1021 n/cm2. Neutron Irradiated GaAs TEM investigation revealed a high density of dislocation loops in the unannealed neutron irradiated GaAs. The loop diameters increased after post-irradiation annealing in the range 600 to 800 °C. The dislocation loops were found to be of interstitial type lying on the {110} cleavage planes of GaAs. This finding is in agreement with earlier studies on 300 keV proton bombarded and 1 MeV electron irradiated GaAs where interstitial loops on {110} planes became visible after annealing at temperatures exceeding 500 °C. The small dislocation loops on the {110} planes of the neutron irradiated GaAs transformed to large loops and dislocations after annealing at 1000 °C.
- Full Text:
- Date Issued: 2011
Wavelength-modulation spectroscopy for the evaluation of the photoresponse of solar cells
- Mandanirina, Nambinintsoa Roméoh Hasinjatovo
- Authors: Mandanirina, Nambinintsoa Roméoh Hasinjatovo
- Date: 2016
- Subjects: Gallium arsenide semiconductors , Solar cells , Modulation spectroscopy
- Language: English
- Type: Thesis , Masters , MSc
- Identifier: http://hdl.handle.net/10948/7244 , vital:21312
- Description: This study describes the development of a wavelength-modulation spectroscopy technique for the evaluation of solar cell devices. In particular, the technique is used to investigate the sub-bandgap response associated with the incorporation of GaSb quantum rings into the active region of a conventional GaAs p-i-n solar cell. These GaSb/GaAs quantum ring solar cells are a class of third generation cells, with the potential to exceed the Shockley-Queisser efficiency limit of single junction devices. Wavelength-modulation spectroscopy (WMS) techniques involve the modulation of the wavelength of a pseudo-monochromatic light source, with the resulting variation in the measured photocurrent then being a measure of the differential optical response of the solar cell. Although the conventional photocurrent spectrum of a solar cell is a good measure of the optical response characteristics, the differential technique gives supplemental detail related to the absorption spectrum. In addition to the basic WMS setup, we also developed an in situ flux correction module to ensure that a constant excitation intensity is maintained during the wavelength modulation. The excitation source inherently has a spectral dependence that leads to an undesirable contribution to the photocurrent signal. The operation of the flux corrected WMS setup has been demonstrated by photocurrent and photo-capacitance response measurements to obtain the differential quantum efficiency and charging characteristics of the quantum ring solar cells.
- Full Text:
- Date Issued: 2016
- Authors: Mandanirina, Nambinintsoa Roméoh Hasinjatovo
- Date: 2016
- Subjects: Gallium arsenide semiconductors , Solar cells , Modulation spectroscopy
- Language: English
- Type: Thesis , Masters , MSc
- Identifier: http://hdl.handle.net/10948/7244 , vital:21312
- Description: This study describes the development of a wavelength-modulation spectroscopy technique for the evaluation of solar cell devices. In particular, the technique is used to investigate the sub-bandgap response associated with the incorporation of GaSb quantum rings into the active region of a conventional GaAs p-i-n solar cell. These GaSb/GaAs quantum ring solar cells are a class of third generation cells, with the potential to exceed the Shockley-Queisser efficiency limit of single junction devices. Wavelength-modulation spectroscopy (WMS) techniques involve the modulation of the wavelength of a pseudo-monochromatic light source, with the resulting variation in the measured photocurrent then being a measure of the differential optical response of the solar cell. Although the conventional photocurrent spectrum of a solar cell is a good measure of the optical response characteristics, the differential technique gives supplemental detail related to the absorption spectrum. In addition to the basic WMS setup, we also developed an in situ flux correction module to ensure that a constant excitation intensity is maintained during the wavelength modulation. The excitation source inherently has a spectral dependence that leads to an undesirable contribution to the photocurrent signal. The operation of the flux corrected WMS setup has been demonstrated by photocurrent and photo-capacitance response measurements to obtain the differential quantum efficiency and charging characteristics of the quantum ring solar cells.
- Full Text:
- Date Issued: 2016
On the Processing of InAsSb/GaSb photodiodes for infrared detection
- Authors: Odendaal, Vicky
- Date: 2008
- Subjects: Gallium arsenide semiconductors , Photovoltaic cells , Infrared detectors , Gas-detectors
- Language: English
- Type: Thesis , Masters , MSc
- Identifier: vital:10523 , http://hdl.handle.net/10948/980 , Gallium arsenide semiconductors , Photovoltaic cells , Infrared detectors , Gas-detectors
- Description: The objective of this dissertation is the development of the necessary processing steps needed to manufacture infrared photodiodes on InAs1-xSbx material. Preliminary surface preparation steps were performed on both InAs and InSb material, thus covering both possible extremes of the antimony mole fraction. The first experiments endeavoured to characterise the effect of several possible etchants with regards to etch rate, repeatability, limitations for photolithographic patterning and the resultant surface roughness. The etchants investigated include a lactic acid based etchant, a sulphuric acid based etchant, an acetic acid based etchant, an ammonium based etchant, a hydrochloric acid based etchant as well as an organic rinse procedure. These cleaning and etching steps were evaluated at several temperatures. Measurements were performed on an Alpha Step stylus profiler as well as an atomic force microscope. Metal-insulator-semiconductor capacitor devices were manufactured, on both InAs and InSb material, in order to investigate the effects of the above-mentioned etchants combined with surface passivation techniques in terms of surface state densities. Capacitance-versus-bias voltage measurements were done to determine the resultant surface state densities and to compare these to the surface state density of an untreated reference sample. The surface passivation techniques included KOH, Na2S as well as (NH4)2S anodisation. Auger electron spectroscopy measurements were done on InAs and InSb material in order to examine possible surface contamination due to the etchants as well as combinations of these etching and anodisation procedures. The extent of surface coverage by contaminants as well as by the intrinsic elements was measured. The results of the cleaning and etching as well as the surface passivation studies were used to manufacture photovoltaic infrared diodes on an MOCVD (metal oxide chemical vapour deposition) grown p-InAs0.91Sb0.09/i- InAs0.91Sb0.09/n-GaSb structure. Current-versus-voltage and electro-optical measurements were performed on the these diodes in order to evaluate the effect of sulphuric acid based etching combined with KOH, Na2S or (NH4)2S anodisation on the detector performance. The results of surface passivated structures were compared to those of an unpassivated reference detector.
- Full Text:
- Date Issued: 2008
- Authors: Odendaal, Vicky
- Date: 2008
- Subjects: Gallium arsenide semiconductors , Photovoltaic cells , Infrared detectors , Gas-detectors
- Language: English
- Type: Thesis , Masters , MSc
- Identifier: vital:10523 , http://hdl.handle.net/10948/980 , Gallium arsenide semiconductors , Photovoltaic cells , Infrared detectors , Gas-detectors
- Description: The objective of this dissertation is the development of the necessary processing steps needed to manufacture infrared photodiodes on InAs1-xSbx material. Preliminary surface preparation steps were performed on both InAs and InSb material, thus covering both possible extremes of the antimony mole fraction. The first experiments endeavoured to characterise the effect of several possible etchants with regards to etch rate, repeatability, limitations for photolithographic patterning and the resultant surface roughness. The etchants investigated include a lactic acid based etchant, a sulphuric acid based etchant, an acetic acid based etchant, an ammonium based etchant, a hydrochloric acid based etchant as well as an organic rinse procedure. These cleaning and etching steps were evaluated at several temperatures. Measurements were performed on an Alpha Step stylus profiler as well as an atomic force microscope. Metal-insulator-semiconductor capacitor devices were manufactured, on both InAs and InSb material, in order to investigate the effects of the above-mentioned etchants combined with surface passivation techniques in terms of surface state densities. Capacitance-versus-bias voltage measurements were done to determine the resultant surface state densities and to compare these to the surface state density of an untreated reference sample. The surface passivation techniques included KOH, Na2S as well as (NH4)2S anodisation. Auger electron spectroscopy measurements were done on InAs and InSb material in order to examine possible surface contamination due to the etchants as well as combinations of these etching and anodisation procedures. The extent of surface coverage by contaminants as well as by the intrinsic elements was measured. The results of the cleaning and etching as well as the surface passivation studies were used to manufacture photovoltaic infrared diodes on an MOCVD (metal oxide chemical vapour deposition) grown p-InAs0.91Sb0.09/i- InAs0.91Sb0.09/n-GaSb structure. Current-versus-voltage and electro-optical measurements were performed on the these diodes in order to evaluate the effect of sulphuric acid based etching combined with KOH, Na2S or (NH4)2S anodisation on the detector performance. The results of surface passivated structures were compared to those of an unpassivated reference detector.
- Full Text:
- Date Issued: 2008
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